C. T. Black and O. Bezencenet, "Nanometer-Scale Pattern Registration and Alignment by Directed Diblock Copolymer Self Assembly," IEEE Transactions on Nanotechnology 3, 412 (2004).

Scanning Electron Microscope images showing the use surface topography to direct the assembly of in-plane cylindrical diblock copolymer domains so as to subdivide larger patterns defined using optical lithography. In the image on the left, a 0.6um wide doughnut pattern contains 15 parallel block copolymer periods. In the image to the right, 0.5um diameter circles are subdivided into bullseye patterns. This approach provides an application for self assembly in the fabrication of complex microelectronic circuits entailing alignment of multiple patterned layers. This fabrication method combines the alignment capabilities of optical lithography with the sub-lithographic dimensions achievable using self-assembled diblock copolymer films.
 

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