Mingtao Li, Lei Chen, Stephen Y. Chou "Direct 3-D patterning using nanoimprint technology" Applied Physics Letters 78 3322-3324 (2001).

Description:

New "soft lithographic" techniques, developed for fabricating structures at nanometer scales, could revolutionize this technology.  In nano-imprint lithography, a mold made by electron beam lithography and reactive ion etching is used to imprint structures onto a thin polymer film. The polymer templates are then used to make metal structures by means of vapor deposition, and this is followed by the lift-off of the polymer film in acetone.

Another application of the technology could be for making the bridges, such as the one shown above, that are widely used in monolithic integrated circuits and nano-electromechanical systems. The researchers envisage that their technique will be used for mass-producing three-dimensional nanostructures. The imprinting step is much faster than conventional nanofabrication techniques, and the moulds can be reused many times, repaying the time investment that is needed to make them.

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