Description:

Researchers have demonstrated a molded dewetting (MD) process that is capable of producing highly regular and reproducible nanoscopic polymer patterns using a microscopic patterned mold. Theoretical simulations confirm that this MD process does not rely on specific interactions between the polymer and the substrate or the mold, hence it can be used for general purpose patterning. This nanoscale patterning method can also be combined with other approaches such as microcontact printing to produce complex structures.  This image shows anisotropic blocks formed by annealing a 90nm polystyrene film under a PDMS mold.

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