Real space imaging of Sub-nm sized beam profiles with/without propagation through a thin film of material.  Sub-nm sized electron beams can be used to detect local symmetry, mean inner potential, electrostatic stray fields and other characteristics of materials.
Atomic resolution information by EELS (Electron Energy Loss Spectroscopy) can only be obtained by careful control of the propagation and spreading of the beam within the sample.

A multislice calculation was used to estimate 3D-intensity distributions in sapphire illuminated with beams of 0.1–0.3 nm diameter, with the focus, Cs-value, and specimen thickness as the variables. The 3D-intensity pattern is then used to predict spatially resolved ELNES signals, interpreted as a convolution of the atomically projected density of states (DOS) with an elastic excitation envelope.

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