Description:

Thin film materials are critical components of microelectronics, integrated optoelectronics, data storage technologies and micro-electro-mechanical systems. These technologies depend critically on the morphology, properties, behavior and reliable performance of a wide variety of metallic, semiconductor and polymeric thin films on substrates.

The above figure shows the AFM images of surface evolution in a 10 nm thick Si_0.82Ge_0.18/Si(100) thin films anealed at 850^oC for (a) 5 min (b) 10 min (c) 20 min and (d) 2 hours.

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