A.Stanishevsky. Fabrication of submicron structures in CVD diamond by focused ion beam. Journal of Superhard Materials,20, N6 (1998) 4.

A.Stanishevsky, A.S.Prakash, S.Aggarwal, J.Melngailis, and R.Ramesh. Focused ion-beam patterning of nanoscale ferroelectric capacitors. Proc. of 42nd Int.Conf. Ion, Electron, Photon Beam Technol. and Nanofabrication., May 26-29 (1998), Chicago,Il. J.Vac.Sci.Technol.B, 16 (1998) 3899.

 

Description:

Focused ion beams (FIBs) are widely used for implantation, sputtering, and deposition at the micro- and nanoscale. FIBs provide unique capabilities for prototyping new micro- and nano-devices, materials modification, basic studies of ion/surface interactions, and much more.  The ion beam scans the surface in a choosen pattern, resulting in material removal.  The above image is of a FIB milled tip in a CVD (Chemical Vapor Deposition) diamond microcrystal. The tip height is ~400 nm, and the radius is ~40 nm.

 

Please contact the webmaster if you would like to submit an image